Tin (Sn) Sputtering Target Description:

Tin sputtering targets are primarily classified based on purity and shape, 

both of which jointly determine their performance and application scenarios.

Industrial grade (99.9%): 

Suitable for general industrial coatings, such as decorative coatings and ordinary conductive films, 

with relatively relaxed purity requirements.

High-purity grade (99.99% / 4N): The mainstream choice for high-end applications such as semiconductors 

and optoelectronic devices. Strict impurity control ensures the electrical performance and reliability of the thin film.

Ultra-high purity grade (99.999% / 5N): Used for cutting-edge scientific research and high-end semiconductor manufacturing, 

requiring extremely high purity to meet demanding process requirements.

Circular targets:  (e.g., φ25.4mm, φ50.8mm, φ100mm, etc.), and thicknesses typically 1-6mm. 

Suitable for most circular sputtering equipment.

Square targets: Suitable for large-area coating applications such as flat panel displays. 

Custom sizes are available upon request.

Custom-shaped targets: Non-standard shapes customized to meet specific equipment requirements for specialized processes.

Tin target deposition produces thin films with excellent conductivity, 

superior optical transmittance, and stable chemical properties, making them widely used in numerous high-tech fields.

Transparent conductive films and display devices

Photovoltaic solar cells

Electronic packaging and connectivity

Optical coatings

Decorative and functional coatings

Tin-5N-COA

Related Sputtering Targets